Positive surface modification resist system

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 669-672

  Shirai, Masamitsu ^a   Endo, Mitsuteru ^a   Tsunooka, Masahiro ^a   Endo, Masayuki ^b  

^a Osaka Prefecture University   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Photobase generator; Positive photoresist; Surface imaging

Indexed keywords

EID: 0001572664     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.669     Document Type: Article

References (8)

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