Characteristics for negative and positive tone resists with direct write electron beam and SCALPEL exposure systems

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2873-2877

  Sato, Mitsuru ^a   Ocala, L E ^b   Novembre, A E ^b   Ohmori, Katsumi ^c   Ishikawa, Kiyoshi ^c   Katsumata, Katsuhiko ^c   Nakayama, Toshimasa ^c  

^a OHKA America Inc   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033260753     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591087     Document Type: Article

References (10)

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