X-ray Lithography with Environmentally Stable Chemical Amplification Positive Resist

ACS Symposium Series

Volumn 620, Issue , 1996, Pages 387-398

  Ito, Hiroshi ^a   Breyta, Greg ^a   Hofer, Don ^b   Pomerene, Andrew ^b   Petrillo, Karen ^b   Seeger, David ^b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1542791333     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1996-0620.ch030     Document Type: Article

References (17)

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