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Volumn 10, Issue 4, 1997, Pages 609-612

Characterization of tBOC based chemically amplified resist for SR lithography

Author keywords

Chemically amplified resist; Contrast; Sensitivity curve; SR lithography

Indexed keywords

EID: 0010172058 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.10.609 Document Type: Article

Times cited : (2)

References (10)

1
- 0029543660
- Y. Nishioka, K. Shiozawa, T.Oishi, K. Knanamoto, Y. Tokuda, H. Sumitani, S. Aya, H. Yabe, K. Itoga, T. Hifumi, K. Marumoto, T. Kuroiwa, T. Kawahara, K. Nishikawa, T. Oomori, T. Fujino, S. Yamamoto, S. Uzawa, M. Kimata, M. Nunoshita, and H. Abe, IEDM Tech. Dig., (1995) 903
- (1995) IEDM Tech. Dig. , pp. 903
- Nishioka, Y.¹ Shiozawa, K.² Oishi, T.³ Knanamoto, K.⁴ Tokuda, Y.⁵ Sumitani, H.⁶ Aya, S.⁷ Yabe, H.⁸ Itoga, K.⁹ Hifumi, T.¹⁰ Marumoto, K.¹¹ Kuroiwa, T.¹² Kawahara, T.¹³ Nishikawa, K.¹⁴ Oomori, T.¹⁵ Fujino, T.¹⁶ Yamamoto, S.¹⁷ Uzawa, S.¹⁸ Kimata, M.¹⁹ Nunoshita, M.²⁰ Abe, H.²¹ more..

2
- 0029215168
- R. DellaGuardia, C. Wasik, D. Puisto, R. Fair, L. Liebman, J. Rocque, S. Nash, A. Lamberti, G. Collini, R. French, B. Vampatella, G. Gifford, V. Nastasi, P. Sa, F. Volkringer, T.Zell, D. Seeger, and J. Warlaumont, Proc. SPIE, 2437 (1995) 112
- (1995) , vol.2437 , pp. 112
- DellaGuardia, R.¹ Wasik, C.² Puisto, D.³ Fair, R.⁴ Liebman, L.⁵ Rocque, J.⁶ Nash, S.⁷ Lamberti, A.⁸ Collini, G.⁹ French, R.¹⁰ Vampatella, B.¹¹ Gifford, G.¹² Nastasi, V.¹³ Sa, P.¹⁴ Volkringer, F.¹⁵ Zell, T.¹⁶ Seeger, D.¹⁷ Warlaumont, J.¹⁸ Spie, P.¹⁹

3
- 0029407003
- K. Deguchi, K. Miyoshi, H. Ban, T. Matsuda, T. Ohno, and Y. Kado, J. Vac. Sci. Technol. B., 13 (1995) 3040
- (1995) J. Vac. Sci. Technol. B. , vol.13 , pp. 3040
- Deguchi, K.¹ Miyoshi, K.² Ban, H.³ Matsuda, T.⁴ Ohno, T.⁵ Kado, Y.⁶

4
- 0007893235
- T.Kumada, S. Kubota, H. Koezuka, S. Kishimura, T. Hanawa, and H. Nagata, J. Photopolym. Sci. Technol., 4 (1991) 469
- (1991) J. Photopolym. Sci. Technol. , vol.4 , pp. 469
- Kumada, T.¹ Kubota, S.² Koezuka, H.³ Kishimura, S.⁴ Hanawa, T.⁵ Nagata, H.⁶

5
- 0008009953
- T. Nakanishi, K. Ikegami, I. Kodera, A. Maruyama, T. Matsuda, M. Morita, T. Nakagawa, S. Nakamura, S. Nakata, N. Ohishi, S. Okuda, K.Shimohata, T. Takeuchi, H. Tanaka, C. Tsukishima, S. Yamamoto, S. Yokoyama, and T. Yamada, Rev. Sci. Instrum., 66 (1995) 1968
- (1995) Rev. Sci. Instrum. , vol.66 , pp. 1968
- Nakanishi, T.¹ Ikegami, K.² Kodera, I.³ Maruyama, A.⁴ Matsuda, T.⁵ Morita, M.⁶ Nakagawa, T.⁷ Nakamura, S.⁸ Nakata, S.⁹ Ohishi, N.¹⁰ Okuda, S.¹¹ Shimohata, K.¹² Takeuchi, T.¹³ Tanaka, H.¹⁴ Tsukishima, C.¹⁵ Yamamoto, S.¹⁶ Yokoyama, S.¹⁷ Yamada, T.¹⁸

6
- 0029226588
- H.Sumitani, K. Itoga, M. Inoue, H. Watanabe, N. Yamamoto, K. Marumoto, and Y. Matsui, Proc. SPIE, 2437 (1995) 94
- (1995) Proc. SPIE , vol.2437 , pp. 94
- Sumitani, H.¹ Itoga, K.² Inoue, M.³ Watanabe, H.⁴ Yamamoto, N.⁵ Marumoto, K.⁶ Matsui, Y.⁷

7
- 1542417754
- T. Fujino, H. Maeda, T. Kumada, K.Moriizumi, S. Kubota, H. Koezuka, H. Morimoto, Y. Watakabe, and N. Tsubouchi, J. Vac. Sci. Technol. B., 11 (1993) 2773
- (1993) J. Vac. Sci. Technol. B. , vol.11 , pp. 2773
- Fujino, T.¹ Maeda, H.² Kumada, T.³ Moriizumi, K.⁴ Kubota, S.⁵ Koezuka, H.⁶ Morimoto, H.⁷ Watakabe, Y.⁸ Tsubouchi, N.⁹

8
- 0012082191
- T. Kumada, S. Kubota, H. Koezuka, T. Hanawa, and H. Morimoto, Proc. SPIE, 1925 (1993) 31
- (1993) Proc. SPIE , vol.1925 , pp. 31
- Kumada, T.¹ Kubota, S.² Koezuka, H.³ Hanawa, T.⁴ Morimoto, H.⁵

9
- 85033538336
- unpublished data
- H. Nobutoki, unpublished data
- Nobutoki, H.¹

10
- 85033516042
- to be published
- T. Kumada, H. Adachi, H.Watanabe, and H.Sumitani, Proc. SPIE, 3049 (1997) to be published
- (1997) Proc. SPIE , vol.3049
- Kumada, T.¹ Adachi, H.² Watanabe, H.³ Sumitani, H.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.