Dissolution characteristics and surface morphology of chemically amplified resists in X-ray lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6830-6835

  Nakamura, Jiro ^a   Kawai, Yoshio ^a   Deguchi, Kimiyoshi ^a   Matsuda, Tadahito ^a   Oda, Masatoshi ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Chemically amplified resist; Dissolution inhibitor; Surface morphology; X ray lithography

Indexed keywords

EID: 0010125714     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6830     Document Type: Article

References (17)

1. H. Ban, J. Nakamura, K. Deguchi and A. Tanaka: J. Vac. Sci. Technol. 159 (1991) 3387.
2. H. Ban, J. Nakamura, K. Deguchi and A. Tanaka: J. Vac. Sci. Technol. B12 (1994) 3905.
3. H. Ito and C. G. Willson: ACS Symp. Ser. 242 (1984) 11.
4. K. Deguchi, K, Miyoshi, M. Oda, T. Malsuda, A. Ozawa and H. Yoshihara: J. Vac. Sci. Technol. B14 (1996) 4294.
5. H. Ito: J. Photopolym. Sci. Technol. 10 (1998) 379.
6. Y. Kawai, A. Otaka, A. Tanaka, J. Nakamura, K. Sakuma, T. Matsuda and Y. Sakakibara: Jpn. J. Appl. Phys. 36 (1997) 2085.
7. F. Houlohan, J. K. Kometani, A. G. Timko, R. S. Hutton, R. A. Cirelli, E. Reichmanis, O. Nalamasu, A. H. Gabor, A. N. Medina, J. J. Biafore and S. G. Slater: J. Photopolym. Sci. Technol. 10 (1998) 419.
8. Y. Somemura, K. Deguchi, K. Miyoshi and T. Matsuda: Jpn. J. Appl. Phys. 31 (1992) 4221.
9. W. Scheckler, T. Ogawa, T. Tanaka and E. Takeda: Jpn. J. Appl. Phys. 32 (1993) 5951.
10. M. Nagase, H. Namatsu, K. Kurihara, K. Iwadate, K. Murase and T. Makino: Microelectron. Eng. 30 (1996) 419.
11. T. Yoshimura, H. Shiraishi, J. Yamamoto, T. Terasawa and S. Okazaki: Appl. Phys. Lett. 68 (1996) 1799.
12. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki and K. Kurihara: Appl. Phys. Lett. 71 (1997) 2388.
13. K. Kamon, K. Nakazawa, A. Yamaguchi, N. Matsuzawa, T. Ohfuji, K. Kanzaki and S. Tagawa: J. Vac. Sci. Technol. B15 (1997) 2610.
14. J. Nakamura, K. Deguchi and H. Ban: J. Photopolym. Sci. Technol. 10 (1998) 571.
15. T. Hosokawa, T. Kitayama, T. Hayasaka, S. Ido, Y. Uno, A. Shibayama, J. Nakata, K. Nishimura and M. Nakajima: Rev. Sci. Instrum. 60 (1989) 1783.
16. T. Kaneko, Y. Saitoh, S. Itabashi and H. Yoshihara: J. Vac. Sci. Technol. 69 (1991) 3214.
17. J. Nakamura, H. Ban, Y. Kawai and A. Tanaka: ACS Symp. Ser. 579 (1994) 151