Abrasion and dissolution interaction of Al in a phosphoric acid solution

Thin Solid Films

Volumn 379, Issue 1-2, 2000, Pages 107-113

  Tsai, Wen Ta ^a   Huang, Tsung Min ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASION; ALUMINUM; CHEMICAL POLISHING; DISSOLUTION; ELECTROCHEMISTRY; PHOSPHORIC ACID;

CHEMICAL-MECHANICAL POLISHING; ROTATING CYLINDER SYSTEMS;

PROTECTIVE COATINGS;

EID: 0034503515     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01405-X     Document Type: Article

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