Surface characteristics, etching behaviors and chemical-mechanical polishing of aluminum alloy thin films

Materials Research Society Symposium - Proceedings

Volumn 477, Issue , 1997, Pages 125-130

  Tseng, Wei Tsu ^a   Wu, Jun ^a   Chang, Yee Shyi ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; ALUMINUM ALLOYS; CHEMICAL POLISHING; COMPOSITION EFFECTS; ETCHING; HYDROGEN PEROXIDE; METALLIC FILMS; PH EFFECTS; SEMICONDUCTOR DEVICE MANUFACTURE; SLURRIES; SURFACE PROPERTIES; WEAR OF MATERIALS;

CHEMICAL MECHANICAL POLISHING;

THIN FILMS;

EID: 0030699883     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)