Hardness measurements at shallow depths on ultra-thin amorphous carbon films deposited onto silicon and Al2O3-TiC substrates

Thin Solid Films

Volumn 379, Issue 1-2, 2000, Pages 166-172

  Lemoine, P ^a   Zhao, J F ^a   Quinn, J P ^a   McLaughlin, J A ^a   Maguire, P ^a  

^a Univ U   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CARBON; ELASTIC MODULI; HARDNESS; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SUBSTRATES; TITANIUM CARBIDE; TRIBOLOGY; ULTRATHIN FILMS;

ULTRA-THIN AMORPHOUS CARBON FILMS;

AMORPHOUS FILMS;

EID: 0034498327     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01543-1     Document Type: Article

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