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Volumn 609, Issue , 2000, Pages A441-A446
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Fast deposition of microcrystalline silicon films using the high-density microwave plasma utilizing a spokewise antenna
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Author keywords
[No Author keywords available]
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Indexed keywords
FILM GROWTH;
ION BEAMS;
ION BOMBARDMENT;
MICROWAVE ANTENNAS;
PHOTOCONDUCTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING SILICON;
SURFACE PHENOMENA;
MICROWAVE PLASMA;
SPOKEWISE ANTENNA;
SEMICONDUCTING FILMS;
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EID: 0034431106
PISSN: 02729172
EISSN: None
Source Type: Journal
DOI: 10.1557/proc-609-a4.4 Document Type: Article |
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Times cited : (2)
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References (9)
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