Design and characterization of a high numerical aperture lens system for scanned laser lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2193-2196

  Allen, P C ^a   Bohan, M J ^a   Buck, P D ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342986869     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589612     Document Type: Article

References (4)

1. G. A. Burns and J. A. Schoeffel, Proc. SPIE 772, 269 (1987).
2. B. J. Grenon, D. C. Defibaugh, D. M. Sprout, H. C. Hamaker, and P. D. Buck, Proc. SPIE 2322, 50 (1994).
3. P. C. Allen and P. A. Warkentin, Proc. SPIE 1088, 12 (1989).
4. Y. Borodovsky, U.S. Patent No. 4,767,215 (30 Aug. 1988).