Reaction of Si(111) surface with acetone

Thin Solid Films

Volumn 376, Issue 1-2, 2000, Pages 89-98

  Takami, T ^a   Ishidzuka, S ^a   Igari, Y ^a   Range, H ^a   Kusunoki, I ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; ADSORPTION; ANNEALING; COMPOSITION EFFECTS; DESORPTION; EPITAXIAL GROWTH; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SUBSTRATES; TWINNING; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON OXYCARBIDE COMPOUNDS;

PROTECTIVE COATINGS;

EID: 0034317061     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01358-4     Document Type: Article

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