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Volumn 357-358, Issue , 1996, Pages 693-697
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Photodissociation and desorption of multilayer acetone on a Si(100) surface by 193 nm laser irradiation
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Author keywords
Ketones; Laser induced thermal desorption (LITD); Photochemistry; Silicon; Silicon carbide; Solid gas interfaces; Surface photochemistry; Thermal desorption
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Indexed keywords
DISSOCIATION;
FREE RADICALS;
INTERFACES (MATERIALS);
IRRADIATION;
MASS SPECTROMETRY;
PHOTOCHEMICAL REACTIONS;
PULSED LASER APPLICATIONS;
SEMICONDUCTING SILICON;
SURFACE PHENOMENA;
TEMPERATURE PROGRAMMED DESORPTION;
THERMOANALYSIS;
VAPORIZATION;
ACETONE MOLECULES;
ACETYL RADICAL;
METHYL RADICALS;
MULTILAYER ACETONE;
PHOTODISSOCIATION;
PULSED LASER IRRADIATION;
SOLID GAS INTERFACES;
SURFACE PHOTOCHEMISTRY;
THERMAL DESORPTION SPECTRA;
ACETONE;
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EID: 0030165501
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/0039-6028(96)00247-6 Document Type: Article |
Times cited : (9)
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References (10)
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