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Volumn 11, Issue 5, 1998, Pages 31-36

Soft lithography and microfabrication

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Indexed keywords


EID: 0002849243     PISSN: 09538585     EISSN: None     Source Type: Trade Journal    
DOI: 10.1088/2058-7058/11/5/30     Document Type: Article
Times cited : (111)

References (7)
  • 1
    • 0006274655 scopus 로고    scopus 로고
    • A path to nanolithography
    • December p
    • F Cerrina and C Marrian 1996 A path to nanolithography MRS Bulletin December p56
    • (1996) MRS Bulletin , pp. 56
    • Cerrina, F.1    Marrian, C.2
  • 2
    • 0030126226 scopus 로고    scopus 로고
    • Semiconductor lithography for the next millennium
    • April p
    • LGeppert 1996 Semiconductor lithography for the next millennium IEEE Spectrum April p33
    • (1996) IEEE Spectrum , pp. 33
    • LGeppert1
  • 3
    • 0031556442 scopus 로고    scopus 로고
    • Using soft lithography to fabricate Ga/As heterostructure field effect transistors
    • J Hu et al. 1997 Using soft lithography to fabricate Ga/As heterostructure field effect transistors Appl. Phys. Lett. 71 2020-2022
    • (1997) Appl. Phys. Lett , vol.71 , pp. 2020-2022
    • Hu, J.1
  • 4
    • 0003404472 scopus 로고    scopus 로고
    • Micro-and nanofabrication techniques based on selfassembled monolayers in, ed, and, Blackwell Science, Oxford
    • P F Nealey et al. 1997 Micro-and nanofabrication techniques based on selfassembled monolayers in Molecular Electronics (ed) J Jortner and M Ratner (Blackwell Science, Oxford)
    • (1997) Molecular Electronics
    • Nealey, P.F.1
  • 7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.