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Volumn 110, Issue , 2000, Pages 41-67

In situ and ex situ characterization of thin films by soft X-ray emission spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; INTERFACES (MATERIALS); THIN FILMS; VAPOR DEPOSITION; X RAY SPECTROSCOPY;

EID: 0034298951     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0368-2048(00)00156-0     Document Type: Article
Times cited : (19)

References (85)
  • 57
    • 0041785088 scopus 로고
    • Quantum well and superlattice physics
    • G.H. Dhler, Schulman J.N. Washington. DC: SPIE
    • Dawson P., Moore K.J., Foxton C.T. Quantum well and superlattice physics. Dhler G.H., Schulman J.N. Proc. SPIE. Vol. 762:1987;208 SPIE, Washington. DC.
    • (1987) Proc. SPIE , vol.762 , pp. 208
    • Dawson, P.1    Moore, K.J.2    Foxton, C.T.3
  • 68
    • 5244260360 scopus 로고
    • G. Alefeld, Vlkl J. Berlin, Heidelberg, New York: Springer Verlag
    • Alefeld G., Vlkl J. Topics in Applied Physics (Hydrogen in Metals, I and II). Vol. 29:1978;9 Springer Verlag, Berlin, Heidelberg, New York.
    • (1978) Topics in Applied Physics (Hydrogen in Metals, I and II) , vol.29 , pp. 9
  • 77
    • 0003666038 scopus 로고
    • S.M. Rossnagel, J.J. Cuomo, & W.D. Westwood. Park Ridge, NJ: Noyes Publications
    • Westwood W.D. Rossnagel S.M., Cuomo J.J., Westwood W.D. Handbook of Plasma Processing Technology. 1989;233 Noyes Publications, Park Ridge, NJ.
    • (1989) Handbook of Plasma Processing Technology , pp. 233
    • Westwood, W.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.