|
Volumn 78, Issue 1, 2000, Pages 11-15
|
On the structure and composition of crystalline carbon nitride films synthesized by microwave plasma chemical vapor deposition
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRYSTAL STRUCTURE;
METHANE;
MICROWAVES;
MORPHOLOGY;
NITRIDES;
NITROGEN;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
STOICHIOMETRY;
SYNTHESIS (CHEMICAL);
THERMAL EFFECTS;
THIN FILMS;
CARBON NITRIDE;
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD);
CRYSTALLINE MATERIALS;
|
EID: 0034292515
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(00)00505-5 Document Type: Article |
Times cited : (17)
|
References (16)
|