Image formation in EUV lithography: multilayer and resist properties

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 13-20

  Cerrina, F ^a   Bollepalli, S ^a   Khan, M ^a   Solak, H ^a   Li, W ^a   He, D ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; ELECTRIC FIELDS; IMAGE PROCESSING; LIGHT PROPAGATION; MASKS; MULTILAYERS; REFLECTION; ULTRAVIOLET SPECTROSCOPY;

EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYER STACK; RESIST PROPERTY; SPHERICAL ABERRATION;

LITHOGRAPHY;

EID: 0034206444     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00260-4     Document Type: Article

References (22)

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