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Volumn , Issue , 1996, Pages 683-686
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Electrical Characterization of CVD TiN Upper Electrode for Ta2O5 Capacitor
a a a a a a |
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Author keywords
[No Author keywords available]
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Indexed keywords
AMMONIA;
ANNEALING;
CHLORINE;
ELECTRODES;
LEAKAGE CURRENTS;
METALLIC FILMS;
TANTALUM OXIDES;
TITANIUM NITRIDE;
CAPACITORS;
CHEMICAL VAPOR DEPOSITION;
DESORPTION;
ELECTRIC PROPERTIES;
SPECTROSCOPIC ANALYSIS;
TANTALUM COMPOUNDS;
TITANIUM COMPOUNDS;
BARRIER LAYERS;
CHLORINE CONTENT;
CONFORMALITY;
CURRENT LEVELS;
DOUBLE ELECTRODES;
ELECTRICAL CHARACTERISTIC;
ELECTRICAL CHARACTERIZATION;
LOW-LEAKAGE CURRENT;
STORAGE CAPACITOR;
TIN FILMS;
CHLORINE COMPOUNDS;
ELECTRODES;
TANTALUM OXIDE;
THERMAL DESORPTION SPECTROSCOPY;
TITANIUM CHLORIDE;
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EID: 0030421407
PISSN: 01631918
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IEDM.1996.554073 Document Type: Conference Paper |
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Times cited : (19)
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References (6)
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