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Volumn 209, Issue 2-3, 2000, Pages 237-241
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Growth of novel InP-based materials by He-plasma-assisted epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
BERYLLIUM;
CRYSTAL IMPURITIES;
ELECTRIC CONDUCTIVITY OF SOLIDS;
ELECTRON CYCLOTRON RESONANCE;
ENERGY GAP;
HALL EFFECT;
HELIUM;
MOLECULAR BEAM EPITAXY;
PLASMA APPLICATIONS;
RAPID THERMAL ANNEALING;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR GROWTH;
GAS SOURCE MOLECULAR BEAM EPITAXY (GSMBE);
SEMICONDUCTING INDIUM PHOSPHIDE;
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EID: 0034140841
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(99)00547-3 Document Type: Article |
Times cited : (5)
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References (9)
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