He‐plasma assisted epitaxy for highly resistive, optically fast InP‐based materials

Applied Physics Letters

Volumn 69, Issue 4, 1996, Pages 509-511

  Mitchell, D B ^a   Robinson, B J ^a   Thompson, D A ^a   Qian, l i ^b,c,d   Benjamin, S D ^b,c,d   Smith, P W E ^b,c,d  

^a MCMASTER UNIVERSITY   (Canada)

^b Ontario Laser and Lightwave Research Centre   (Canada)

^c UNIVERSITY OF TORONTO   (Canada)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85015127361     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117769     Document Type: Article

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