Low-temperature fabrication (450°C) and evaluation of Pb(Zr,Ti)O3 thin films by RF reactive sputtering using (ZrTi + PbO) target

Integrated Ferroelectrics

Volumn 12, Issue 2-4, 1996, Pages 151-160

  Zhang, Weixiao ^a   Sasaki, Kimihiro ^a   Hata, Tomonobu ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

(ZrTi + PbO) target; Ferroelectric; Metallic mode; Oxide mode; PZT; Quasi metallic mode

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; FERROELECTRIC MATERIALS; FILM GROWTH; FILM PREPARATION; LATTICE CONSTANTS; LEAD COMPOUNDS; LEAKAGE CURRENTS; PERMITTIVITY; PEROVSKITE; POLARIZATION; SPUTTER DEPOSITION; THERMAL EFFECTS;

LEAD OXIDE; LEAD ZIRCONATE TITANATE;

DIELECTRIC FILMS;

EID: 0030311953     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589608013058     Document Type: Article

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