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Volumn 47, Issue 4, 2000, Pages 891-893
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Limitations of the modified shift-and-ratio technique for extraction of the bias dependence of Leff and Rsd of LDD MOSFET's
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
ELECTRIC RESISTANCE;
GATES (TRANSISTOR);
SEMICONDUCTOR DEVICE MODELS;
SEMICONDUCTOR DOPING;
EFFECTIVE CHANNEL LENGTH;
MODIFIED SHIFT-AND-RATIO TECHNIQUES;
MOSFET DEVICES;
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EID: 0033879951
PISSN: 00189383
EISSN: None
Source Type: Journal
DOI: 10.1109/16.831010 Document Type: Article |
Times cited : (9)
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References (9)
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