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Volumn 9, Issue 10, 1990, Pages 1123-1126

A Universal MOSFET Mobility Degradation Model for Circuit Simulation

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER HARDWARE DESCRIPTION LANGUAGES; INTEGRATED CIRCUITS, VLSI - COMPUTER SIMULATION; TRANSISTORS, FIELD EFFECT - COMPUTER AIDED DESIGN;

EID: 0025503170     PISSN: 02780070     EISSN: 19374151     Source Type: Journal    
DOI: 10.1109/43.62736     Document Type: Article
Times cited : (27)

References (13)
  • 1
    • 0018683243 scopus 로고
    • Characterization of the electron mobility in the inverted (100) Si surface
    • A. G. Sabnis and J. T. Clemens, “Characterization of the electron mobility in the inverted (100) Si surface,” in IEDM Tech. Dig., 1979. pp. 18–21.
    • (1979) IEDM Tech. Dig. , pp. 18-21
    • Sabnis, A.G.1    Clemens, J.T.2
  • 4
    • 0020199664 scopus 로고
    • Mobility degradation due to the gate field in the inversion layer of MOSFET’s
    • Oct.
    • K. Y. Fu, “Mobility degradation due to the gate field in the inversion layer of MOSFET’s,” IEEE Electron. Dev. Letts., vol. EDL-3. pp. 292–293, Oct. 1982.
    • (1982) IEEE Electron. Dev. Letts. , vol.EDL-3 , pp. 292-293
    • Fu, K.Y.1
  • 5
    • 0024178927 scopus 로고
    • On the universality of inversion-layer mobility in N- and P-channel MOSFET’s
    • S. Takagi, M. Iwase. and A. Toriumi. “On the universality of inversion-layer mobility in N- and P-channel MOSFET’s,” in IEDM Tech. Dig., 1988, pp. 398–401.
    • (1988) IEDM Tech. Dig. , pp. 398-401
    • Takagi, S.1    Iwase, M.2    Toriumi, A.3
  • 6
    • 0023596537 scopus 로고
    • Universal mobility-field curves for electrons and holes in MOS inversion layers
    • J. W. Watt and J. D. Plummer, “Universal mobility-field curves for electrons and holes in MOS inversion layers.” in Proc. Sxmp. VLSI Tech., 1987, pp. 81–82.
    • (1987) Proc. Sxmp. VLSI Tech. , pp. 81-82
    • Watt, J.W.1    Plummer, J.D.2
  • 7
    • 0024703660 scopus 로고
    • Universality of mobility-gate field characteristics of electrons in the inversion charge layer and its application in MOSFET modeling
    • July
    • S.-W. Lee, “Universality of mobility-gate field characteristics of electrons in the inversion charge layer and its application in MOSFET modeling.” IEEE Trans. Computer-Aided Design, vol. 8. pp. 742–750, July 1989.
    • (1989) IEEE Trans. Computer-Aided Design , vol.8 , pp. 742-750
    • Lee, S.-W.1
  • 9
    • 0041725896 scopus 로고
    • The two-dimensional lattice scattering mobility in a semiconductor inversion layer
    • Oct.
    • S. Kawaji. “The two-dimensional lattice scattering mobility in a semiconductor inversion layer.” J. Phxs. Soc. Japan, vol. 27, no. 4, pp. 906–908, Oct. 1969.
    • (1969) J. Phxs. Soc. Japan , vol.27 , Issue.4 , pp. 906-908
    • Kawaji, S.1
  • 10
    • 0019048875 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • Aug.
    • S. C. Sun and J. D. Plummer. “Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces,” IEEE Trans. Electron Devices, vol. ED-27. pp. 1497–1508, Aug. 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 11
    • 0024684382 scopus 로고
    • A new modeling approach for transverse-field dependent mobility in MOS inversion layers
    • June
    • H. Shin et al., “A new modeling approach for transverse-field dependent mobility in MOS inversion layers,” IEEE Trans. Electron Devices, vol. 36. pp. 1117–1124, June 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 1117-1124
    • Shin, H.1
  • 12
    • 0024172244 scopus 로고
    • A deep-submicron MOSFET model for analog/ digital circuit simulations
    • M.-C. Jeng et al., “A deep-submicron MOSFET model for analog/ digital circuit simulations.” IEDM Tech. Dig., 1988, pp. 114–117.
    • (1988) IEDM Tech. Dig. , pp. 114-117
    • Jeng, M.-C.1
  • 13
    • 0024105667 scopus 로고
    • A physically based mobility model for numerical simulation of nonplanar devices
    • Nov.
    • C. Lombardi et al., “A physically based mobility model for numerical simulation of nonplanar devices.” IEEE Trans. Computer-Aided Design, vol. 7. pp. 1164–1171. Nov. 1988.
    • (1988) IEEE Trans. Computer-Aided Design , vol.7 , pp. 1164-1171
    • Lombardi, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.