Strength measurement and calculations on silicon-based nanometric oscillators for scanning force microscopy operating in the gigahertz range

Applied Surface Science

Volumn 157, Issue 4, 2000, Pages 320-325

  Kawakatsu, Hideki ^a   Toshiyoshi, Hiroshi ^a   Saya, Daisuke ^a   Fukushima, Kimitake ^a   Fujita, Hiroyuki ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; OSCILLATORS (ELECTRONIC); OXYGEN; SCANNING; SILICON ON INSULATOR TECHNOLOGY;

SCANNING FORCE MICROSCOPY (SFM); SEPARATION BY IMPLANTED OXYGEN (SIMOX);

ATOMIC FORCE MICROSCOPY;

EID: 0033743812     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00546-2     Document Type: Article

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