Growth of SiCN films by magnetron sputtering

Surface Engineering

Volumn 16, Issue 3, 2000, Pages 225-228

  Wei, J ^a   Gao, Y ^b   Zhang, D H ^b   Hing, P ^b   Mo, Z Q ^c  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c Singapore Productivity and Std Bd   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL BONDS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; MAGNETRON SPUTTERING; NITRIDES; SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON CARBONITRIDE;

SILICON COMPOUNDS;

EID: 0033727125     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708400101517198     Document Type: Article

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