Optimization of properties of carbon nitride and CNx/TiN coatings prepared by single-cathode magnetron sputtering

Surface and Coatings Technology

Volumn 86-87, Issue PART 2, 1996, Pages 586-591

  Marumo, Yasuo ^a   Yang, Zunde ^a   Chung, Yip Wah ^a  

^a Northwestern University   (United States)

Author keywords

Carbon nitride coating; CNx TiN coating; Single cathode magnetron sputtering

Indexed keywords

CARBON; EXPERIMENTS; HARDNESS; MAGNETRON SPUTTERING; NITRIDES; OPTIMIZATION;

CARBON NITRIDE COATINGS; COMPUTER HARD DISKS; SINGLE-CATHODE MAGNETRON SPUTTERING;

PROTECTIVE COATINGS;

EID: 0030394846     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03008-3     Document Type: Article

References (27)

1. A.Y. Liu and M.L. Cohen, Science, 245 (1989) 841.
2. A.Y. Liu and M.L. Cohen, Phys. Rev., B 41 (1990) 10727.
3. N. Nakayama, Y. Tsuchiya, S. Tamada, K. Kosuge, S. Nagata, K. Takahhiro and S. Yamaguchi, Jpn. J. Appl. Phys., 32 (1993) L1465.
4. M.Y. Chen, Ph.D. Thesis, Northwestern University, 1994.
5. J.J. Cuomo, P.A. Leary, D. Yu, W. Reuter and M. Frish, J. Vac. Sci. Technol., 16 ( 1979) 299.
6. D. Li, E. Cutiongco, Y.W. Chung, M.S. Wong and W.D. Sproul, Surf. Coat. Technol., 68/69 (1994) 611.
7. C.J. Torng, J.M. Sivertsen, J.H. Judy and C. Chang, J. Mater. Res., 5 (1990) 2490.
8. H. Sjotrom, I. Ivanov, M. Johansson, L. Hultman, J.E. Sundgren, S.V. Hainsworth, T.F. Page and L.R. Wallenberg, Thin Solid Films, 246 (1994) 103.
9. D. Li, Y.W. Chung, M.S. Wong and W.D. Sproul, J. Appl. Phys., 74 (1993) 219.
10. K.M. Yu, M.L. Cohen, E.E. Haller, W.L. Hansen, A.Y. Liu and I.C. Wu, Phys. Rev., B 49 (1994) 5034.
11. V.N. Gurarie, A.V. Orlov, K.W. Nugent, P. Weiser and S. Prawer, MRS. Symp. Proc., 349 (1994) 37.
12. J.F.D. Chubaci, T. Sakai, T. Yamamoto, K. Ogata, A. Ebe and F. Fujimoto, Nucl. Instrum. Meth. Phys. Res., B 80/81 (1993) 463.
13. F. Fujimoto and K. Ogata, Jpn. J. Appl. Phys., 32 (1993) L420.
14. F. Xiong, R.P.H. Chang and C.W. White, MRC Symp. Proc., 280 (1993) 587.
15. C. Niu, Y.Z. Lu and C.M. Lieber, Science, 261 (1993) 334.
16. J. Narayan, J. Reddy, N. Biunno, S.M. Kanetkar, P. Tiwari and N. Parikh, Mater. Sci. Eng., 26 (1994) 49.
17. A. Hoffman, I. Gouzman and R. Brener, Appl. Phys. Lett., 64 (1994) 845.
18. D. Marton, A.H. Al-Bayati, S.S. Todorov, K.J. Boyd and J.W. Rabalais, Nucl. Instrum. Meth Phys. Res., B 90 (1994) 277.
19. S. Veprek, J. Weidmann and F. Glatz, J. Vac. Sci. Technol., A 13 (1995) 1.
20. F.L. Freire Jr., G. Mariotto, R.S. Brusa, A. Zecca and C.A. Achete, Diamond Rel. Mater., 4 (1995) 499.
21. M.R. Wixom, J. Am. Ceram. Soc., 73 (1990) 1973.
22. L. Maya, D.R. Cole, and E.W. Hagaman, J. Am. Ceram. Soc., 74 (1991) 1686.
23. T. Sekine, H. Kanda, Y. Bando, M. Yokoyama and K. Hojou, J. Mater. Sci. Lett., 9 (1990) 1376.
24. D. Li, X. Chu, S.C. Cheng, X.W. Lin, V.P. Dravid, Y.W. Chung, M.S. Wong and W.D. Sproul, Appl. Phys. Lett., 67 (1995) 203.
25. D. Li, Ph.D. Thesis, Northwestern University, 1995.
26. G.M. Pharr and W.C. Oliver, MRS Bull., July 1992, 28.
27. Y. Marumo, Z. Yang, and Y.W. Chung, to be published.