Resolution deterioration in emission electron microscopy due to object roughness

Annalen der Physik (Leipzig)

Volumn 9, Issue 6, 2000, Pages 441-451

  Nepijko, S A ^a   Sedov, N N ^b   Schonhense G ^c   Escher, M ^d   Bao, Xinhe ^e   Huang, Weixin ^e  

^a INSTITUTE OF PHYSICS   (Ukraine)

^b Moscow Military Institute   (Russian Federation)

^c JOHANNES GUTENBERG UNIVERSITY   (Germany)

^d Focus GmbH   (Germany)

^e DALIAN INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON EMISSION; MATHEMATICAL MODELS; SURFACE ROUGHNESS;

EMISSION ELECTRON MICROSCOPY;

ELECTRON MICROSCOPY;

EID: 0033718017     PISSN: 00033804     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3889(200006)9:6<441::AID-ANDP441>3.0.CO;2-J     Document Type: Article

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