A spherical-aberration-corrected 200 kV transmission electron microscope

Ultramicroscopy

Volumn 75, Issue 1, 1998, Pages 53-60

  Haider, Max ^a,d   Rose, Harald ^b   Uhlemann, Stephan ^a   Schwan, Eugen ^a   Kabius, Bernd ^c   Urban, Knut ^c  

^a EUROPEAN MOLECULAR BIOLOGY LABORATORY   (Germany)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

^d CEOS GmbH   (Germany)

Author keywords

Contrast delocalization; Spherical aberration; Spherical aberration correction; Structure images; Transmission electron microscopy

Indexed keywords

ABERRATIONS; IMAGING TECHNIQUES; INTERFACES (MATERIALS); OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS;

CONTRAST DELOCALIZATION; SPHERICAL ABERRATION; SPHERICAL ABERRATION CORRECTION; STRUCTURE IMAGES;

TRANSMISSION ELECTRON MICROSCOPY;

ARTICLE; CONTRAST SENSITIVITY; DIAGNOSTIC IMAGING; ELECTROMAGNETIC RADIATION; IMAGE QUALITY; IMAGING SYSTEM; PHASE CONTRAST MICROSCOPY; QUANTUM MECHANICS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0032190822     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(98)00048-5     Document Type: Article

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