Properties of ion beam deposited tetrahedral fluorinated amorphous carbon films (ta-C:F)

Materials Research Society Symposium - Proceedings

Volumn 593, Issue , 2000, Pages 335-340

  Ronning, C ^a   Merk, R ^b   Feldermann, H ^a   Harbsmeier, F ^a   Hofsass H ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; CARRIER CONCENTRATION; COMPOSITION; COMPRESSIVE STRESS; FILM GROWTH; FLUORINE; ION BEAMS; PHYSICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMODYNAMIC PROPERTIES; THICKNESS MEASUREMENT;

PLASMON ENERGY; VACUUM ANNEALING; VOLATILE MOLECULES;

AMORPHOUS FILMS;

EID: 0033714224     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (25)

1. H. Yokomichi, A. Masuda, J. Appl. Phys. 86, 2468 (1999).
2. H. Yang, D.J. Tweet, Y. Ma, T. Nguyen, Appl. Phys. Lett. 73, 1514 (1998).
3. K. Endo, K. Shinoda, T. Tatsumi, J. Appl. Phys. 86, 2739 (1999).
4. D.M. Bhusari, A.S. Kumbar, S.T. Kshirsagar, J. Appl. Phys. 77, 54 (1995).
5. K. Endo, T. Tatsumi, Appl. Phys. Lett. 68, 2864 (1996);
6. Jpn. J. Appl. Phys. 37, 1809 (1998).
7. Y. Ma, H. Yang, J. Guo, C. Sathe, A. Agui, J. Nordgren, Appl. Phys. Lett. 72, 3353 (1998).
8. R. d'Agostino, R. Lamendola, P. Favia, A. Giquel, J. Vac. Sci. Techno. A 12, 308 (1994).
9. J.P. Chang, H.W. Krautter, W. Zhu, R.L. Opila, C.S. Pai, J. Vac. Sci. Techno. A 17, 2969 (1999).
10. H. Hofsäss, C. Ronning, in "Beam Processing of Advanced Materials", J. Singh, S.M. Copley, J. Mazumder (eds.), Conference Proceedings of ASM (1996) 29-56;
11. Appl. Phys. A 66, 153 (1998);
12. Dia. and Rel. Mater. 6, 830 (1997).
13. M. Weiler, S. Sattel, T. Giessen, K. Jung, H. Ehrhardt, V. S. Veerasamy, J. Robertson, Phys. Rev. B 53, 1594 (1996).
14. J. Kulik, G. D. Lempert, E. Grossman, D. Marton, J. W. Rabalais, Y. Lifshitz, Phys. Rev. 652, 15812 (1995).
15. H. Hofsäss, H. Binder, T. Klumpp, E. Recknagel, Dia. & Relat. Mater. 3, 137 (1994).
16. M. Uhrmacher, K. Pampus, F.J. Bergmeister, D. Purschke, K.P. Lieb, Nucl. Instr. and Meth. B 9, 234 (1985).
17. N.P. Barradas, C. Jeynes, R.P. Webb, Appl. Phys. Lett. 71, 291 (1997).
18. G.G. Stoney, Proc. Roy. Soc. A 82, 1 (1909).
19. H. Hofsäss, C. Ronning, U. Griesmeier, M. Gross, Mat. Res. Soc. Symp. Proc. Vol. 354, 93 (1995);
20. Mat. Res. Soc. Symp. Proc. Vol. 438, 575 (1997).
21. H.K. Schmid, Microsc. Microanal. Microstruct. 6, 99 (1995).
22. C. Ronning, E. Dreher, J.-U. Thiele, P. Oelhafen, H. Hofsäss, Dia. Rel. Mat. 6, 830 (1997).
23. D.R. McKenzie, D. Muller, B.A. Pailthorpe, Phys. Rev. Lett. 67, 773 (1991).
24. T. A. Friedmann, J.P. Sullivan, J.A. Knapp, D.R. Tallant, D.M. Follstaedt, D.L. Medlin, P.B. Mirkarimi, Appl. Phys. Lett. 71, 3820 (1997).
25. th Int Conf. on Ion Beam Analysis IBA14, Dresden, Germany, July 1999.