Ion energy distribution in a planar inductive oxygen discharge

Journal of Physics D: Applied Physics

Volumn 32, Issue 7, 1999, Pages 798-803

  Gudmundsson, J T ^a  

^a UNIVERSITY OF ICELAND   (Iceland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ION BOMBARDMENT; ION EXCHANGE; MASS SPECTROMETRY; MATHEMATICAL MODELS; PLASMA DENSITY; PLASMA SHEATHS; PRESSURE EFFECTS;

ION ENERGY DISTRIBUTION; PLASMA POTENTIAL; QUADRUPOLE MASS SPECTROMETER;

OXYGEN;

EID: 0033531576     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/7/008     Document Type: Article

References (26)

1. Lieberman M A and Gottscho R A 1994 Physics of Thin Films vol 18, ed M Francombe and J Vossen (New York: Academic)
2. Hopwood J 1992 Plasma Sources Sci. Technol. 1 109-16
3. Coburn J W and Kay E 1972 J. Appl. Phys. 43 4965-4971
4. Kuypers A D and Hopman H J 1988 J. Appl. Phys. 63 1894-8
5. Liu J, Huppert G L and Sawin H H 1990 J. Appl. Phys. 68 3916-34
6. Toups M F and Ernie D W 1990 J. Appl. Phys. 68 6125-32
7. Wild C and Koidl P 1991 J. Appl. Phys. 69 2909-22
8. Hamaguchi S, Farouki R T and Dalvie M 1992 Phys. Rev. Lett. 68 44-7
9. Köhler K, Horne D E and Coburn J W 1984 J. Appl. Phys. 58 3350-5
10. Hopwood J 1993 Appl. Phys. Lett. 62 940-2
11. Kortshagen U and Zethoff M 1995 Plasma Sources Sci. Technol. 4 541-50
12. Woodworth J R, Riley M E, Meister D C, Aragon B P, Le M S and Sawin H H 1996 J. Appl. Phys. 80 1304-11
13. Woodworth J R, Riley M E, Miller P A, Hebner G A and Hamilton T W 1997 J. Appl. Phys. 81 5950-9
14. Woodworth J R, Riley M E, Miller P A, Nichols C A and Hamilton T W 1997 J. Vac. Sci. Technol. A 15 3015-23
15. Gudmundsson J T 1999 Plasma Sources Sci. Technol. 8 58-64
16. Nichols C A, Woodworth J R and Hamilton T W 1998 J. Vac. Sci. Technol. A 16 3389-95
17. Godyak V A, Piejak R B and Alexandrovich B M 1992 Plasma Sources Sd. Technol. 1 36-58
18. Gudmundsson J T 1998 Plasma Sources Sci. Technol. 7 330-6
19. Holber W M and Forster J 1990 J. Vacuum Sci. Technol. A 8 3720-5
20. Field D, Klemperer D F, May P W and Song Y P 1991 J. Appl. Phys. 70 82-92
21. [21 ] Tuszewski M, Scheuer T J and Tobin J A 1995 J. Vac. Sci. Technol. A 13 839-42
22. Tuszewski M 1996 J. Appl. Phys. 79 8967-75
23. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
24. Godyak V A and Maximov V N 1977 Vestnik Moskovskogo Universiteta, seria Fiz. Astron. 18 51-6
25. Godyak V A and Sternberg N 1990 Phys. Rev. A 42 2299-312
26. Kawamura E, Vahedi V, Lieberman M A and Birdsall C K 1995 Review of ion energy distributions in capacitively coupled rf plasma reactors Memorandum No UCB/ERL M95/49 Electron Research Laboratory, University of California, Berkeley