Helicon plasma source for ionized physical vapor deposition

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 401-404

  Hayden, D B ^a   Juliano, D R ^a   Neumann, M N ^a   Allain, M C ^a   Ruzic, D N ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Helicon antenna; Ionized PVD (IPVD); Magnetron sputtering; Plasma source

Indexed keywords

COATING; PLASMA TREATMENT; SPUTTERING; VAPOR DEPOSITION;

EID: 0033503872     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00488-0     Document Type: Conference Paper

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