Novel materials processing and applications by gas cluster ion beams

European Physical Journal D

Volumn 9, Issue 1-4, 1999, Pages 55-61

  Yamada, I ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAM ASSISTED DEPOSITION; ION BEAMS; ION BOMBARDMENT; ION SOURCES; IONS; MOLECULAR DYNAMICS; MOSFET DEVICES; SILICON CARBIDE; SPUTTERING; SUBSTRATES; TEMPERATURE;

CLUSTER ION BEAMS; CLUSTER IONS; DYNAMICS SIMULATION; GAS CLUSTER ION BEAMS; HIGH RATE SPUTTERING; MATERIAL APPLICATION; MATERIALS PROCESSING; MONOMER ION BEAMS; NOVEL MATERIALS; ULTRA-SHALLOW ION IMPLANTATION;

OXIDE FILMS;

EID: 0033427569     PISSN: 14346060     EISSN: None     Source Type: Journal    
DOI: 10.1007/PL00010953     Document Type: Article

References (33)

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