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Volumn 116-119, Issue , 1999, Pages 755-765

Diagnostics and modeling of a hollow-cathode arc deposition plasma

Author keywords

Amorphous carbon deposition; Electric probe measurements; Hollow cathode arc plasma; Mass spectrometry; Numerical modeling

Indexed keywords

AMORPHOUS MATERIALS; CARBON; DISSOCIATION; MAGNETIC FIELD EFFECTS; MASS SPECTROMETRY; MATHEMATICAL MODELS;

EID: 0033401265     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00210-8     Document Type: Conference Paper
Times cited : (15)

References (16)
  • 12
    • 0003427863 scopus 로고
    • Introduction to Plasma Physics and Controlled Fusion
    • New York: Plenum Press
    • Chen F.F. Introduction to Plasma Physics and Controlled Fusion. Plasma Physics. vol. 1:1980;Plenum Press, New York.
    • (1980) Plasma Physics , vol.1
    • Chen, F.F.1
  • 13
    • 0003420568 scopus 로고
    • M. Moisan, & J. Pelletier. Amsterdam: Elsevier
    • Moisan M., Pelletier J. Microwave Excited Plasmas. 1992;330 Elsevier, Amsterdam.
    • (1992) Microwave Excited Plasmas , pp. 330


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.