In situ examination of the plasma processes during the deposition of hard carbon coatings from a low-pressure arc plasma

Surface and Coatings Technology

Volumn 88, Issue 1-3, 1997, Pages 50-56

  Bolt, H ^a   Hemel, V ^a   Koch, F ^a   Nickel, H ^a   Wiechers, C ^a   Avni, R ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Carbon coatings; Diagnostic measurements; Hollow cathode arc discharge; Plasma cvd

Indexed keywords

ACETYLENE; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC ARCS; METHANE; MORPHOLOGY; PLASMA SPRAYING; THIN FILMS;

CARBON COATINGS; LOW-PRESSURE ARC PLASMA; PLASMA CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0030787240     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)02919-2     Document Type: Article

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