The initial stages of copper deposition on bare and chemically modified gold electrodes

Physica Status Solidi (A) Applied Research

Volumn 173, Issue 1, 1999, Pages 51-71

  Schneeweiss, M A ^a   Kolb, D M ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; COPPER; ELECTROCHEMICAL ELECTRODES; GOLD; MATHEMATICAL MODELS; MONOLAYERS; NUCLEATION; PHASE EQUILIBRIA; SURFACE PHENOMENA; THICK FILMS;

CLASSICAL MODEL SYSTEM; ELECTROLYTIC METAL DEPOSITION; SELF ASSEMBLED MONOLAYERS;

ELECTRODEPOSITION;

EID: 0033362139     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199905)173:1<51::AID-PSSA51>3.0.CO;2-O     Document Type: Article

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