Confocal microscopy for simultaneous imaging of Cu electrodeposit morphology and adsorbate fluorescence

Journal of the Electrochemical Society

Volumn 144, Issue 5, 1997, Pages 1529-1536

  Chung, Dean S ^a,b   Alkire, Richard C ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ELECTROLYSIS; FLUORESCENCE; MICROSCOPIC EXAMINATION; SECONDARY ION MASS SPECTROMETRY;

CONFOCAL LASER SCANNING MICROSCOPY; SURFACE MORPHOLOGY;

ELECTRODEPOSITION;

EID: 0031140421     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837636     Document Type: Article

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