Deposition of droplet-free films by vacuum arc evaporation-results and applications

IEEE Transactions on Plasma Science

Volumn 27, Issue 4, 1999, Pages 1039-1044

  Witke, Thomas ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

Carbon coatings; High current vacuum arc; Metallic films; Plasma filter; Pulsed vacuum arc

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; CARBON; DEPOSITION; METALLIC FILMS; PLASMA SOURCES; PROTECTIVE COATINGS; SURFACE STRUCTURE; THIN FILMS; TITANIUM NITRIDE; VACUUM APPLICATIONS;

HIGH CURRENT PULSED ARC; PLASMA FILTER; VACUUM ARC EVAPORATION;

ELECTRIC ARCS;

EID: 0033350058     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.782278     Document Type: Article

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