Effects of N2 addition on aluminum alloy etching in inductively coupled plasma source

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 10, 1999, Pages 6090-6096

  Kim, Kil Ho ^a   Baek, Kye Hyun ^a   Shin, Kang Sup ^a   Park, Changwook ^a   Lee, Won Gyu ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; DISSOCIATION; EMISSION SPECTROSCOPY; NITROGEN; PASSIVATION; PLASMA SOURCES;

INDUCTIVELY COUPLED PLASMA SOURCES;

PLASMA ETCHING;

EID: 0033338163     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6090     Document Type: Article

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