Overview of plasma induced damage after dry etch processing

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1998, Pages 320-326

  Karzhavin, Yuri ^a   Wu, Wei ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; DEFECTS; DRY ETCHING; PLASMA ETCHING; SILICON WAFERS;

PLASMA INDUCED WAFER CHARGING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032278102     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)