Residual stress in diamond films: Origins and modelling

Thin Solid Films

Volumn 357, Issue 2, 1999, Pages 189-201

  Michler, J ^a   Mermoux, M ^b   Von Kaenel, Y ^a   Haouni, A ^b   Lucazeau, G ^b   Blank, E ^a  

^a EPFL   (Switzerland)

^b LEPMI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; COMPRESSIVE STRESS; CRYSTAL ORIENTATION; FILM GROWTH; FINITE ELEMENT METHOD; GRAIN SIZE AND SHAPE; MATHEMATICAL MODELS; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SILICON; SUBSTRATES; THERMAL STRESS;

PLATE THEORY;

DIAMOND FILMS;

EID: 0033309349     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00528-3     Document Type: Article

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