Stress distribution in heteroepitaxial chemical vapor deposited diamond films

Journal of Applied Physics

Volumn 81, Issue 4, 1997, Pages 1726-1736

  Von Kaenel, Y ^a   Stiegler, J ^a   Michler, J ^a   Blank, E ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000902791     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364006     Document Type: Article

References (65)

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