Diamond nucleation on silicon during bias treatment in chemical vapour deposition as analysed by electron microscopy

Diamond and Related Materials

Volumn 6, Issue 5-7, 1997, Pages 747-751

  Stammler, M ^a   Stockel R ^a   Ley, L ^a   Albrecht, M ^a   Strunk, H P ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Chemical vapour deposition; Diamond nucleation; Electron microscopy; Silicon

Indexed keywords

EID: 0000059411     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(96)00730-3     Document Type: Article

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