Deposition of heteroepitaxial diamond films on 2 in silicon substrates

Diamond and Related Materials

Volumn 5, Issue 3-5, 1996, Pages 251-255

  Jiang, X ^a   Paul, M ^a   Klages, C P ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Diamond nucleation; Heteroepitaxy; Large area deposition; Microwave plasma CVD

Indexed keywords

EID: 0003911637     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00477-7     Document Type: Article

References (9)

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