Effect of laser-induced dissociation of SiH3 radicals in SiH4 plasmas during atomic hydrogen measurements using laser-induced fluorescence by a two-photon excitation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 1, 1999, Pages 155-158

  Miyazaki, K ^a   Mishiro, Y ^b   Kajiwara, T ^b   Uchino, K ^b   Muraoka, K ^b   Okada, T ^b   Maeda, M ^b  

^a KURUME NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033483677     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581566     Document Type: Article

References (7)

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