Atomic-scale analysis of plasma-enhanced chemical vapor deposition from SiH4/H2 plasmas on Si substrates

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 673-678

  Ramalingam, Shyam ^a   Maroudas, Dimitrios ^a   Aydil, Eray S ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; COMPUTER SIMULATION; FILM GROWTH; FREE RADICALS; HYDROGEN; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SILANES; SILICON WAFERS;

ATOMIC-SCALE ANALYSIS;

SEMICONDUCTING FILMS;

EID: 0032651742     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)