Gate quality of ex situ deposited Al/SiNx:H/n-In0.53Ga0.47As devices after rapid thermal annealing

Semiconductor Science and Technology

Volumn 14, Issue 7, 1999, Pages 628-631

  Blanco, M N ^a   Redondo, E ^a   Martil I ^a   Gonzalez Diaz G ^a  

^a UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; CRYSTAL LATTICES; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTROMAGNETIC DISPERSION; ELECTRON CYCLOTRON RESONANCE; RAPID THERMAL ANNEALING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING FILMS; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR PLASMAS;

CAPACITANCE-VOLTAGE HIGH-LOW FREQUENCY METHODS; ELECTRON CYCLOTRON RESONANCE PLASMA METHODS;

MISFET DEVICES;

EID: 0033153967     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/14/7/307     Document Type: Article

References (18)

1. Hasegawa H, Akazawa M, Ishii H, Uraie A, Iwadate H and Ohue E 1990 J. Vac. Sci. Technol. B 8 867
2. Hasegawa H 1989 Proc. SPIE 1144 150
3. Mui D S L, Demirel A L, Strite S, Wang Z, Reed J, Biswas D and Morkoç H 1993 J. Crystal Growth 127 803-6
4. Mui D S L, Biswas D, Reed J, Demirel A L, Strite S and Morkoç H 1992 Appl. Phys. Lett. 60 20
5. Park D-G, Chen Z, Botchkarev A E, Noor Mohammad S and Morkoç H 1996 Phil Mag. B 74 3
6. Landheer D, Rajesh K, Masson D, Hulse J E, Sproule G I and Quance T 1998 J. Vac. Sci. Technol. A 16 5
7. García S, Mártil I, González-Díaz G and Fernández M 1997 Semicond. Sci. Technol. 12 1650
8. Permiter P L and Swanson J G 1996 J. Electron. Mater. 25 1506
9. Redondo E, Blanco N, Mártil I and González-Díaz G 1999 Appl. Phys. Lett. 74 991
10. Redondo E, Blanco N, Mártil I, González-Díaz D, Peláez R, Dueñas S and Castán H 1999 J. Vac. Sci. Technol. A 17 at press
11. García S, Mártil I, González-Díaz G, Castán E, Dueñas S and Fernández M 1998 J. Appl. Phys. 83 332
12. Nicollian E H and Brews J R 1982 Metal Oxide Semiconductor Physics and Technology (New York: Wiley)
13. Wang Z, Mui D S L, Demirel A L, Biswas D, Reed J and Morkoç H 1992 Appl. Phys. Lett. 61 1826
14. Park D-G, Wang Z, Morkoç H, Alterovitz S A, Smith D G and Tsen S-C Y 1998 J. Vac. Sci. Technol. B 16 3032
15. Diatezua D M, Wang Z, Park D, Chen Z, Rockett A and Morkoç H 1998 J. Vac. Sci. Technol. B 16 507
16. Mui D S L, Wang Z and Morkoç H 1993 Thin Solid Films 231 107-24
17. Martínez F, Mártil I, González-Díaz, Selle B and Sieber I 1998 J. Non-Crystalline Solids 523 227-30
18. Martínez F L, del Prado A, Bravo D, López F, Mártil I and González-Díaz G 1999 J. Vac. Sci. Technol. A 17 at press