Calibration procedures with series impedances and unknown lines simplify on-wafer measurements

IEEE Transactions on Microwave Theory and Techniques

Volumn 47, Issue 1, 1999, Pages 1-5

  Heuermann, Holger ^a,b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

Calibration of a network analyzer; DE embedding; Microwave device and on wafer measurements

Indexed keywords

ALGORITHMS; CALIBRATION; ELECTRIC IMPEDANCE; ELECTRIC NETWORK ANALYZERS; INTEGRATED CIRCUITS; STANDARDS;

SELF-CALIBRATION ALGORITHMS;

WSI CIRCUITS;

EID: 0032762586     PISSN: 00189480     EISSN: None     Source Type: Journal    
DOI: 10.1109/22.740065     Document Type: Article

References (8)

1. H. J. Eul and B. Schiek, "Thru-match-reflect: One result of a rigorous theory for de-embedding and network analyzer calibration," in Proc. 18th European Microwave Conf., Stockholm, Sweden, 1988, pp. 909-914.
2. R. Davidson, K. Jones, and E. Strid, "LRM and LRRM calibrations with automatics determinations of load inductance," in 36th ARFTG Conf. Proc.. Monterey, CA, 1990, pp. 84-91.
3. G. F. Engen and C. A. Hoer, "Thru-reflect-line: An improved technique for calibrating the dual six port automatic network analyzer," IEEE Trans. Microwave Theory Tech.. vol. MTT-27, pp. 987-993, Dec. 1979.
4. H. Heuermann and B. Schiek, "Robust algorithms for Txx network analyzer self-calibration procedures," IEEE Trans. Instrum. Meas., vol. 43, pp. 18-23, Feb. 1994.
5. H. J. Eul and B. Schiek, "A generalized theory and new calibration procedures for network analyzer self-calibration," IEEE Trans. Microwave Theory Tech.. vol. 39, pp. 724-731, Apr. 1991.
6. H. Heuermann and B. Schiek, "Error corrected impedance measurements with a network analyzer," IEEE Trans. Instrum. Meas., vol. 44, pp. 295-299, Apr. 1995.
7. "Results of network analyzer measurements with leakage errors-Corrected with direct calibration techniques," IEEE Trans. Instrum. Meas., pp. 1120-1127, Oct. 1997.
8. H. Heuermann, "LZY: A self-calibration approach in competition to the LRM method for on-wafer measurements," in 45th ARFTG Conf. Proc., Orlando, FL, 1995, pp. 129-136.