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Volumn 34, Issue 2, 1999, Pages 197-209

Self-assembled Germanium-dot multilayers embedded in Silicon

Author keywords

Ge islands; Inhomogeneous strain fields; Low dimensional structures; Stranski Krastanow growth; X ray diffraction; X ray reflectivity

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; ELECTROMAGNETIC WAVE REFLECTION; FILM GROWTH; MULTILAYERS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR GROWTH; STRAIN; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

EID: 0032759544     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4079(199902)34:2<197::AID-CRAT197>3.0.CO;2-A     Document Type: Article
Times cited : (7)

References (43)
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    • Schittenhelm, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.