Difluorosilylene as a precursor for the chemical vapour deposition of titanium silicide

Journal of Materials Chemistry

Volumn 2, Issue 9, 1992, Pages 983-984

  Chen, C C ^a   Yu, J L ^a   Lee, C Y ^a   Liu, C S ^a   Chiu, H T ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Chemical vapour deposition; Thin film; Titanium silicide

Indexed keywords

EID: 0001228501     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/JM9920200983     Document Type: Article

References (8)

1. S. P. Murarka, Silicides for VLSZ Applications, Academic Press, New York 1983
2. S. Wolf and R. N. Tauber, Silicon Processing for the I/LsZ Era, vol. 1.
3. S. P. Murarka, M. H. Read, C. J. Doherty and D. B. Fraser, J. Electrochem. Soc., 1982, 129, 293.
4. J. L. Regolini, D. Bensahel, G. Bomchil and J. Mercier, Appl. Surf. Sci., 1989, 38, 408.
5. G. J. Reynolds, C. B. Cooper III and P. J. Gaczi, J. Appl. Phys., 1989, 65, 3212.
6. M. Janai, S. Aftergood, R. B. Weil and B. Pratt, J. Electrochem. SOC., 1981, 128, 2660.
7. J. L. Yu, M. S. Dissertation, National Tsing Hua University, R.O.C. 1991.
8. P. L. Timms, R. A. Kent, T. C. Ehlert and J. L. Margrave, J. Am. Chem. SOC., 1965, 87, 2824.