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Thin Solid Films

Volumn 52, Issue 2, 1978, Pages 181-194

Kinetics and properties of chemically vapour-deposited tungsten films on silicon substrates

(2) Morosanu, Constantin Eugen a Soltuz, Valerian a

a Research Institute for Electronics Bucharest (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; FILMS - X-RAY ANALYSIS; OPTICAL PROPERTIES; SEMICONDUCTING SILICON;

CHEMICAL VAPOR DEPOSITION;

TUNGSTEN AND ALLOYS;

EID: 0017984726 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(78)90137-2 Document Type: Article

Times cited : (27)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.