Short Time Annealing of Coevaporated Tungsten Silicide Films

Journal of the Electrochemical Society

Volumn 131, Issue 10, 1984, Pages 2446-2451

  Sedgwick, T O ^a   d'Heurle, F M ^a   Cohen, S A ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84950749042     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2115315     Document Type: Article

References (16)

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